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ÀÛ¼ºÀÏ : 15-01-20 18:17
2007
 ±Û¾´ÀÌ : Master
Á¶È¸ : 1,503  
Effective removal of Ga residue from focused ion beam using a plasma cleanerD. S. Ko, Y. M. Park, S. D. Kim, and Y. W. Kim,  Ultramicroscopy 107 (4-5), 368 (2007).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea
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