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ÀÛ¼ºÀÏ : 15-02-02 20:20
2013
 ±Û¾´ÀÌ : Master
Á¶È¸ : 1,562  
Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric, K. S. Min, C. Park, C. Y. Kang, C. S. Park, B. J. Park, Y. W. Kim, B. H. Lee, J. C. Lee, G. Bersuker, P. Kirsch, R. Jammy, and G. Y. Yeom,  Solid State Electron 82, 82 (2013).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
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