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작성일 : 15-01-21 20:48
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2011
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글쓴이 :
Master
 조회 : 1,974
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Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl-2/BCl3 Neutral Beam Etching, J. K. Yeon, W. S. Lim, J. B. Park, N. Y. Kwon, S. I. Kim, K. S. Min, I. S. Chung, Y. W. Kim, and G. Y. Yeom, J Electrochem Soc 158 (5), D254 (2011).
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서울시 관악구 관악로1 서울대학교 31동 411호
실시간관찰전자현미경 연구실
Tel : 02-878-5010 | Fax : 02-878-5010
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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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