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작성일 : 15-01-21 20:53
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2011
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글쓴이 :
Master
 조회 : 1,820
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Effect of Halogen-Based Neutral Beam on the Etching of Ge2Sb2Te5, S. K. Kang, M. H. Jeon, J. Y. Park, G. Y. Yeom, M. S. Jhon, B. W. Koo, and Y. W. Kim, J Electrochem Soc 158 (8), H768 (2011).
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서울시 관악구 관악로1 서울대학교 31동 411호
실시간관찰전자현미경 연구실
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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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