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작성일 : 15-02-02 20:20
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2013
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글쓴이 :
Master
 조회 : 1,848
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Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric, K. S. Min, C. Park, C. Y. Kang, C. S. Park, B. J. Park, Y. W. Kim, B. H. Lee, J. C. Lee, G. Bersuker, P. Kirsch, R. Jammy, and G. Y. Yeom, Solid State Electron 82, 82 (2013).
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서울시 관악구 관악로1 서울대학교 31동 411호
실시간관찰전자현미경 연구실
Tel : 02-878-5010 | Fax : 02-878-5010
COPYRIGHT 2014. ALL RIGHT RESERVED |
In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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