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작성일 : 15-01-20 18:17
2007
 글쓴이 : Master
조회 : 1,121  
Effective removal of Ga residue from focused ion beam using a plasma cleanerD. S. Ko, Y. M. Park, S. D. Kim, and Y. W. Kim,  Ultramicroscopy 107 (4-5), 368 (2007).

 
   
 

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In-situ Electron Microscopy Laboratory
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Seoul National University
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